- 专利标题: Two-terminal vertical 1T-DRAM and method of fabricating the same
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申请号: US16465392申请日: 2017-11-30
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公开(公告)号: US10886274B2公开(公告)日: 2021-01-05
- 发明人: Jea Gun Park , Seung Hyun Song , Min Won Kim
- 申请人: Industry-University Cooperation Foundation Hanyang University
- 申请人地址: KR Seoul
- 专利权人: Industry-University Cooperation Foundation Hanyang University
- 当前专利权人: Industry-University Cooperation Foundation Hanyang University
- 当前专利权人地址: KR Seoul
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2016-0162666 20161201
- 国际申请: PCT/KR2017/013926 WO 20171130
- 国际公布: WO2018/101770 WO 20180607
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L27/102 ; H01L29/87
摘要:
The present invention discloses a two-terminal vertical 1T-DRAM and a method of fabricating the same. According to one embodiment of the present invention, the two-terminal vertical 1T-DRAM includes a cathode layer formed of a first-type high-concentration semiconductor layer; a base region including a second-type low-concentration semiconductor layer formed on the cathode layer and a first-type low-concentration semiconductor layer formed on the second-type low-concentration semiconductor layer; and an anode layer formed of a second-type high-concentration semiconductor layer on the first-type low-concentration semiconductor layer.
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