A mask cleaning apparatus includes: a mask holding unit configured to hold a mask; a light source unit configured to irradiate light onto the mask to remove a deposition material accumulated on a surface of the mask; and a material collecting unit configured to collect the deposition material removed from the mask, wherein the material collecting unit includes: a plurality of collecting cases corresponding to kinds of the deposition material; a rotating plate having a suction hole; and a plate driving unit configured to rotate the rotating plate to connect the suction hole to at least one of the collecting cases. Based on the irradiated light, different organic deposition materials may be collected for reuse.