Invention Grant
- Patent Title: Method of forming SIP module over film layer
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Application No.: US15459997Application Date: 2017-03-15
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Publication No.: US10804119B2Publication Date: 2020-10-13
- Inventor: OhHan Kim , KyungHwan Kim , WoonJae Beak , HunTeak Lee , InSang Yoon
- Applicant: STATS ChipPAC Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/56 ; H01L23/58 ; H01L23/552 ; H01L23/31 ; H01L21/683 ; H01L23/00 ; H01L25/16

Abstract:
A semiconductor device has a semiconductor die or component, including an IPD, disposed over an attach area of a penetrable film layer with a portion of the semiconductor die or component embedded in the penetrable film layer. A conductive layer is formed over a portion of the film layer within the attach area and over a portion of the film layer outside the attach area. An encapsulant is deposited over the film layer, conductive layer, and semiconductor die or component. The conductive layer extends outside the encapsulant. An insulating material can be disposed under the semiconductor die or component. A shielding layer is formed over the encapsulant. The shielding layer is electrically connected to the conductive layer. The penetrable film layer is removed. The semiconductor die or component disposed over the film layer and covered by the encapsulant and shielding layer form an SIP module without a substrate.
Public/Granted literature
- US20180269195A1 Semiconductor Device and Method of Forming SIP Module Over Film Layer Public/Granted day:2018-09-20
Information query
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