The present disclosure relates to a method for manufacturing an OLED device, an OLED device and a display panel. The method for manufacturing the OLED device comprises: forming a first electrode layer on a substrate; forming at least one layer of inorganic film at a position on the first electrode layer corresponding to a pixel defining layer; breaking a first organic layer at an etching angle of the at least one layer of inorganic film when forming the first organic layer; forming the pixel defining layer on the inorganic film; forming the first organic layer on the first electrode layer, the inorganic film and the pixel defining layer; and forming a light emitting layer, a second organic layer and a second electrode layer in this order on the first organic layer.