Invention Grant
- Patent Title: Magnetoresistance effect device
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Application No.: US16364865Application Date: 2019-03-26
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Publication No.: US10756257B2Publication Date: 2020-08-25
- Inventor: Naomichi Degawa
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@17713b4b
- Main IPC: H01L43/08
- IPC: H01L43/08 ; G01R33/09 ; H01L43/02 ; H01L43/10

Abstract:
Provided is a magnetoresistance effect device comprising a magnetoresistance effect element including a first ferromagnetic layer, a second ferromagnetic layer and a spacer layer and a high-frequency signal line. The high-frequency signal line includes an overlapping part disposed at a position overlapping the magnetoresistance effect element and a non-overlapping part disposed at a position not overlapping the magnetoresistance effect element in a plan view from a stacking direction. At least a part of the non-overlapping part is formed to be thicker than at least a part of the overlapping part. A distance in the stacking direction between a virtual plane including a surface on the side of the overlapping part of the first ferromagnetic layer and a center line in the high-frequency signal line in the stacking direction is shorter in at least a part of the overlapping part than in at least a part of the non-overlapping part.
Public/Granted literature
- US20190305215A1 MAGNETORESISTANCE EFFECT DEVICE Public/Granted day:2019-10-03
Information query
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