Invention Grant
- Patent Title: External cavity laser
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Application No.: US16665206Application Date: 2019-10-28
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Publication No.: US10680410B2Publication Date: 2020-06-09
- Inventor: Yangjin Ma , Yang Liu , Ruizhi Shi , Thomas Wetteland Baehr-Jones , Saeed Fathololoumi
- Applicant: Elenion Technologies, LLC
- Applicant Address: US NY New York
- Assignee: Elenion Technologies, LLC
- Current Assignee: Elenion Technologies, LLC
- Current Assignee Address: US NY New York
- Agency: Stratford Managers Corporation
- Main IPC: H01S5/14
- IPC: H01S5/14 ; H01S5/068 ; H01S3/083 ; H01S5/10 ; H01S3/13 ; H01S5/02 ; H01S5/40 ; H01S5/028 ; H01S3/106

Abstract:
Practical silicon-based light sources are still missing, despite the progress in germanium lasers, because both silicon and germanium are indirect-band semiconductors and inefficient at light generation. A tunable and single mode external cavity laser comprising: a gain medium for generating light between a reflective surface at one end of the gain medium; and a wavelength selective reflector at the other end of a laser cavity. A splitter disposed in the laser cavity includes an input port optically coupled to the gain medium, an input/output port optically coupled to the wavelength selective reflector, and an output port for outputting laser light at selected wavelengths. The wavelength selective reflector reflects light of one or more selected periodic wavelengths back to the gain medium via the input/output port, and passes light of non-selected wavelengths out of the laser cavity.
Public/Granted literature
- US20200067276A1 EXTERNAL CAVITY LASER Public/Granted day:2020-02-27
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