- 专利标题: Package structure and method of forming package structure
-
申请号: US15726260申请日: 2017-10-05
-
公开(公告)号: US10672729B2公开(公告)日: 2020-06-02
- 发明人: Chih-Hsuan Tai , Ting-Ting Kuo , Yu-Chih Huang , Chih-Wei Lin , Hsiu-Jen Lin , Chih-Hua Chen , Ming-Da Cheng , Ching-Hua Hsieh , Hao-Yi Tsai , Chung-Shi Liu
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Maschoff Brennan
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; H01L23/00 ; H01L23/31
摘要:
A method of forming a package structure includes disposing a semiconductor device over a first dielectric layer, wherein a first redistribution line is in the first dielectric layer, forming a molding compound over the first dielectric layer and in contact with a sidewall of the semiconductor device, forming a second dielectric layer over the molding compound and the semiconductor device, forming a first opening in the second dielectric layer, the molding compound, and the first dielectric layer to expose the first redistribution line, and forming a first conductor in the first opening, wherein the first conductor is electrically connected to the first redistribution line.
公开/授权文献
信息查询
IPC分类: