A sewing machine acquires a selected pattern that is selected from among a plurality of embroidery patterns. The sewing machine displays a pattern image representing the selected pattern. The sewing machine identifies a specified position indicated by the instruction. The sewing machine determines, when the selected pattern is acquired a plurality of times, whether one of a plurality of the pattern images is displayed at the identified specified position. When it is determined that the pattern image is displayed at the identified specified position, the sewing machine identifies the selected pattern for which the pattern image is displayed at the specified position as the editing target. When it is not determined that the pattern image is displayed at the identified specified position, the sewing machine identifies the selected pattern for which a mask region encompassing the selected pattern is set at the specified position as the editing target.