- 专利标题： Lithographic apparatus and device manufacturing method
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申请号： US16438765申请日： 2019-06-12
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公开(公告)号： US10599054B2公开(公告)日： 2020-03-24
- 发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： NL Veldhoven NL Veldhoven
- 专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
公开/授权文献
- US20190294058A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2019-09-26
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