- 专利标题: Field-effect transistor
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申请号: US16410282申请日: 2019-05-13
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公开(公告)号: US10559665B2公开(公告)日: 2020-02-11
- 发明人: Jinqiao Xie , Edward A. Beam, III
- 申请人: Qorvo US, Inc.
- 申请人地址: US NC Greensboro
- 专利权人: Qorvo US, Inc.
- 当前专利权人: Qorvo US, Inc.
- 当前专利权人地址: US NC Greensboro
- 代理机构: Withrow & Terranova, P.L.L.C.
- 主分类号: H01L29/778
- IPC分类号: H01L29/778 ; H01L29/20 ; H01L29/66 ; H01L29/78
摘要:
A field-effect transistor having a transconductance (gm) that remains within 65% of a maximum gm value over at least 85% of a gate voltage range that transitions the field-effect transistor between an on-state that allows substantial current flow through the channel layer and an off-state that prevents substantial current flow through the channel layer is disclosed. The field-effect transistor includes a substrate and a channel layer having a proximal boundary relative to the substrate and a distal boundary relative to the substrate. The channel layer is disposed over the substrate and comprises a compound semiconductor material that includes at least one element having a concentration that is graded between the proximal boundary and the distal boundary.
公开/授权文献
- US20190267452A1 FIELD-EFFECT TRANSISTOR 公开/授权日:2019-08-29
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