- 专利标题: Deposition apparatus
-
申请号: US15429740申请日: 2017-02-10
-
公开(公告)号: US10547003B2公开(公告)日: 2020-01-28
- 发明人: Jae Wan Park , Ju Eel Mun , Seung Ki Kang , In Hyun Hwang
- 申请人: SAMSUNG DISPLAY CO., LTD.
- 申请人地址: KR Gyeonggi-Do
- 专利权人: SAMSUNG DISPLAY CO., LTD.
- 当前专利权人: SAMSUNG DISPLAY CO., LTD.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Cantor Colburn LLP
- 优先权: KR10-2016-0088199 20160712
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; H01L51/00 ; C23C14/24 ; C23C14/54 ; H01L21/67 ; H01L21/66 ; H01L51/56
摘要:
A deposition apparatus includes a chamber, a first stage and a second stage for supporting substrates within the chamber, an evaporating source assembly moving a first stage area corresponding to the first stage and a second stage area corresponding to the second stage, and including a plurality of nozzles through which a source material is spurted, and a photographing assembly which is disposed between the first stage and the second stage and photographs the plurality of nozzles.
公开/授权文献
- US20180019395A1 DEPOSITION APPARATUS 公开/授权日:2018-01-18
信息查询
IPC分类: