发明授权
- 专利标题: Method for manufacturing array substrate and method for manufacturing display device
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申请号: US16023400申请日: 2018-06-29
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公开(公告)号: US10546905B2公开(公告)日: 2020-01-28
- 发明人: Wenqu Liu , Liwen Dong , Feng Zhang , Zhijun Lv , Ning Dang , Shizheng Zhang
- 申请人: BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Beijing
- 专利权人: BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Beijing
- 代理机构: Nath, Goldberg & Meyer
- 代理商 Joshua B. Goldberg
- 优先权: CN201710595959 20170720
- 主分类号: H01L27/32
- IPC分类号: H01L27/32 ; H01L51/00 ; H01L51/52 ; H01L51/56
摘要:
The present invention provides a method for manufacturing an array substrate, including; a step of providing a substrate; a step of making an electrode layer on the substrate; and a step of making a spacer layer and a spacer column on the electrode layer; wherein the spacer column is made by heat-treatment while the spacer layer is being formed, and a method for manufacturing an array substrate. The method for manufacturing an array substrate provided by the present invention can not only shorten the production cycle, lower the production cost, but also avoid the threshold voltage drift of the TFT due to the irradiation of a large area of ultraviolet rays.
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