- 专利标题: Seal ring structure of integrated circuit and method of forming same
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申请号: US15690398申请日: 2017-08-30
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公开(公告)号: US10546822B2公开(公告)日: 2020-01-28
- 发明人: Nicholas A. Polomoff , Vincent J. McGahay
- 申请人: GLOBALFOUNDRIES INC.
- 申请人地址: KY Grand Cayman
- 专利权人: GLOBALFOUNDRIES INC.
- 当前专利权人: GLOBALFOUNDRIES INC.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Hoffman Warnick LLC
- 代理商 Anthony Canale
- 主分类号: H01L21/70
- IPC分类号: H01L21/70 ; H01L23/58 ; H01L21/768 ; H01L23/00
摘要:
A seal ring structure of an integrated circuit including a first discontinuous seal wall circumscribing a first portion of the integrated circuit, the first seal wall forming a first pattern on a substrate, and a second discontinuous seal wall circumscribing a second portion of the integrated circuit, the second seal wall forming a second pattern on the substrate and the second portion being at least partially offset from the first portion, wherein the first pattern of the first seal wall interlocks with the second pattern of the second seal wall such that the patterns are interweaved without intersecting, wherein a space is formed between the seal walls, the space creating a non-linear path to the integrated circuit, and wherein the seal ring structure fully circumscribes the integrated circuit. A method of forming such a seal ring structure is also disclosed.
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