Invention Grant
- Patent Title: Ion milling device and processing method using the ion milling device
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Application No.: US14901506Application Date: 2014-07-11
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Publication No.: US10515777B2Publication Date: 2019-12-24
- Inventor: Atsushi Kamino , Hisayuki Takasu , Hirobumi Muto
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-156256 20130729
- International Application: PCT/JP2014/068527 WO 20140711
- International Announcement: WO2015/016039 WO 20150205
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/16 ; H01J37/18 ; H01J37/20 ; H01J37/305

Abstract:
This ion milling device is provided with a vacuum chamber (105), an exhaust device (101) for evacuating the interior of the vacuum chamber, a sample stage (103) for supporting a sample (102) to be irradiated inside the vacuum chamber, a heater (107) for heating the interior of the vacuum chamber, a gas source (106) for introducing into the vacuum chamber a gas serving as a heating medium, and a controller (110) for controlling the gas source, the controller controlling the gas source so that the vacuum chamber internal pressure is in a predetermined state during heating by the heater. This enables the control in a short time of the temperature for suppressing condensation, or the like, occurring at atmospheric release after cooling and ion milling a sample.
Public/Granted literature
- US20160155602A1 Ion Milling Device and Processing Method Using the Ion Milling Device Public/Granted day:2016-06-02
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