- 专利标题: Method for manufacturing radiation window and a radiation window
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申请号: US15361186申请日: 2016-11-25
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公开(公告)号: US10483079B2公开(公告)日: 2019-11-19
- 发明人: Pekka Torma , Heikki Johannes Sipila
- 申请人: HS Folis Oy
- 申请人地址: FI Espoo
- 专利权人: HS FOILS OY
- 当前专利权人: HS FOILS OY
- 当前专利权人地址: FI Espoo
- 代理机构: Young & Thompson
- 优先权: FI20155881 20151126
- 主分类号: H01J35/18
- IPC分类号: H01J35/18 ; H01J5/18 ; B23K1/00 ; B23K35/26 ; C23C14/06 ; C23C14/28 ; C23C14/34 ; C23C14/58 ; C23C16/32 ; C23C16/50 ; C23C16/56 ; C23C28/00 ; H01L31/18 ; H01L31/08
摘要:
For manufacturing a radiation window for an X-ray measurement apparatus, an etch stop layer is first produced on a polished surface of a carrier. A thin film deposition technique is used to produce a boron carbide layer on an opposite side of the etch stop layer than the carrier. The combined structure including the carrier, the etch stop layer, and the boron carbide layer is attached to a region around an opening in a support structure with the boron carbide layer facing the support structure. The middle area of carrier is etched away, leaving an additional support structure.
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