Invention Grant
- Patent Title: Method of manufacturing image sensor including nanostructure color filter
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Application No.: US15193229Application Date: 2016-06-27
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Publication No.: US10431624B2Publication Date: 2019-10-01
- Inventor: Seunghoon Han , Yongsung Kim , Seyedeh Mahsa Kamali , Amir Arbabi , Yu Horie , Andrei Faraon , Sungwoo Hwang
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , CALIFORNIA INSTITUTE OF TECHNOLOGY
- Applicant Address: KR Suwon-si US CA Pasadena
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,CALIFORNIA INSTITUTE OF TECHNOLOGY
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,CALIFORNIA INSTITUTE OF TECHNOLOGY
- Current Assignee Address: KR Suwon-si US CA Pasadena
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2015-0163342 20151120
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L27/12 ; H01L21/76 ; H01L27/146 ; H01L21/762

Abstract:
A method of manufacturing an image sensor includes: preparing a sensor substrate including: a sensor layer including a photosensitive cell; and a signal line layer including lines to receive electric signals from the photosensitive cell; forming a first material layer having a first refractive index on the sensor substrate; and forming a nanopattern layer on the first material layer, the nanopattern layer including a material having a second refractive index different from the first refractive index.
Public/Granted literature
- US20170012078A1 METHOD OF MANUFACTURING IMAGE SENSOR INCLUDING NANOSTRUCTURE COLOR FILTER Public/Granted day:2017-01-12
Information query
IPC分类: