Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15718535Application Date: 2017-09-28
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Publication No.: US10388629B2Publication Date: 2019-08-20
- Inventor: Daeshik Kim , Gwanhyeob Koh
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2017-0038650 20170327
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L43/08 ; H01L23/522 ; H01L27/22 ; H01L25/00 ; H01L23/00

Abstract:
A semiconductor device comprises a first semiconductor chip comprising a first substrate. A first magnetic tunnel junction is on the first substrate. A second semiconductor chip comprises a second substrate. A second magnetic tunnel junction is on the second substrate. The second semiconductor chip is positioned on the first semiconductor chip to form a chip stack. A first critical current density required for magnetization reversal of the first magnetic tunnel junction is different than a second critical current density required for magnetization reversal of the second magnetic tunnel junction.
Public/Granted literature
- US20180277517A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-09-27
Information query
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