Invention Grant
- Patent Title: Semiconductor image sensors having channel stop regions and methods of fabricating the same
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Application No.: US15623635Application Date: 2017-06-15
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Publication No.: US10367024B2Publication Date: 2019-07-30
- Inventor: Seungjoo Nah , Jung-Chak Ahn , Kyung-Ho Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2014-0099092 20140801
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A semiconductor device includes a light-receiving element which outputs electric charges in response to incident light, and a drive transistor which is gated by an output of the light-receiving element to generate a source-drain current in proportion to the incident light, wherein the drive transistor include a first gate electrode, a first channel region which is disposed under the first gate electrode, first source-drain regions which are disposed at respective ends of the first channel region and that have a first conductivity type, and a first channel stop region which is disposed on a side of the first channel region, and that separates the light-receiving element and the first channel region, the first channel stop region having a second conductivity type that is different from the first conductivity type.
Public/Granted literature
- US20170287969A1 SEMICONDUCTOR IMAGE SENSORS HAVING CHANNEL STOP REGIONS AND METHODS OF FABRICATING THE SAME Public/Granted day:2017-10-05
Information query
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