Invention Grant
- Patent Title: Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound
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Application No.: US15303845Application Date: 2015-03-30
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Publication No.: US10351584B2Publication Date: 2019-07-16
- Inventor: Atsushi Sakurai , Masako Hatase , Tomoharu Yoshino , Masaki Enzu
- Applicant: ADEKA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ADEKA CORPORATION
- Current Assignee: ADEKA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2014-087310 20140421
- International Application: PCT/JP2015/059903 WO 20150330
- International Announcement: WO2015/163090 WO 20151029
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C07C251/08 ; C23C16/18 ; H01L21/28 ; H01L21/285 ; C23C16/455

Abstract:
An alkoxide compound is represented by General Formula (I) below: wherein R1 to R3 each independently represent hydrogen, a C1-12 hydrocarbon group, etc.; R4 represents a C1-12 hydrocarbon group, etc.; L represents hydrogen, halogen, a hydroxyl group, an amino group, an azi group, a phosphido group, a nitrile group, a carbonyl group, a C1-12 hydrocarbon group, etc.; and M represents a metal atom or a silicon atom, n represents an integer of 1 or more, m represents an integer of 0 or more, and n+m represents the valence of the metal atom or silicon atom.
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