Invention Grant
- Patent Title: Deep channel cathode assembly
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Application No.: US15168925Application Date: 2016-05-31
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Publication No.: US10297415B2Publication Date: 2019-05-21
- Inventor: Anija M , Sergio Lemaitre
- Applicant: GENERAL ELECTRIC COMPANY
- Applicant Address: US NY Schenectady
- Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee Address: US NY Schenectady
- Priority: IN2823/CHE/2015 20150605
- Main IPC: H01J35/06
- IPC: H01J35/06 ; H01J35/08

Abstract:
An improved cathode assembly is disclosed. The improved cathode assembly provides a deep channel for holding filament that enables generation of small focal spots, but is not limited in achieving larger focal spot sizes. The cathode assembly includes at least one deep channel and a filament arranged in a deep channel. The deep channel is configured in a cathode cup surface of the cathode assembly. The filament is arranged in the deep channel for enabling emission of electron beams from the cathode assembly.
Public/Granted literature
- US20160358739A1 DEEP CHANNEL CATHODE ASSEMBLY Public/Granted day:2016-12-08
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