- 专利标题: Multi-layer semiconductor device structure
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申请号: US15867144申请日: 2018-01-10
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公开(公告)号: US10157914B2公开(公告)日: 2018-12-18
- 发明人: Yasutoshi Okuno , Yi-Tang Lin
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: McDermott Will & Emery LLP
- 主分类号: H01L27/06
- IPC分类号: H01L27/06 ; H01L21/8234 ; H01L23/544 ; H01L27/12 ; G03F7/20 ; G03F9/00 ; H01L27/092 ; H01L29/16 ; H01L29/20
摘要:
One embodiment of the instant disclosure provides a semiconductor structure that comprises: a first device layer including a first active layer disposed over a substrate and a first gate layer disposed on the active layer, where at least one of the first active layer and the first gate layer includes a first layer alignment structure; a first bounding layer disposed over the first device layer, the first bounding layer including an opening arranged to detectably expose the first layer alignment structure; and a second device layer disposed over the bounding layer including a second layer alignment structure, where the second layer alignment structure is substantially aligned to the first layer alignment structure through the opening.
公开/授权文献
- US20180130797A1 MULTI-LAYER SEMICONDUCTOR DEVICE STRUCTURE 公开/授权日:2018-05-10
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