Invention Grant
- Patent Title: SiC single crystal and method for producing same
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Application No.: US15366619Application Date: 2016-12-01
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Publication No.: US10094044B2Publication Date: 2018-10-09
- Inventor: Katsunori Danno
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Applicant Address: JP Toyota
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
- Current Assignee Address: JP Toyota
- Agency: Oliff PLC
- Priority: JP2015-244233 20151215
- Main IPC: C30B19/06
- IPC: C30B19/06 ; C30B19/04 ; C30B19/12 ; C30B29/36 ; C30B29/64

Abstract:
A SiC single crystal comprising no polycrystals, and no cracking other than at the side edges is provided. A method for producing SiC single crystal in which seed crystal held at bottom end face of holding shaft is contacted with Si—C solution having temperature gradient to grow SiC single crystal, wherein the contour of the end face of the holding shaft is smaller than the contour of the top face of the seed crystal, the top face of the seed crystal has center section held in contact with the entire surface of the end face of the holding shaft and outer peripheral section that is not in contact with the end face of the holding shaft, and carbon sheet is disposed on the top face of the seed crystal so as to cover at least the outer peripheral section, among the center section and the outer peripheral section.
Public/Granted literature
- US20170167049A1 SIC SINGLE CRYSTAL AND METHOD FOR PRODUCING SAME Public/Granted day:2017-06-15
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