- 专利标题: Movable body apparatus, exposure apparatus, and device manufacturing method
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申请号: US14901543申请日: 2014-06-26
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公开(公告)号: US10048598B2公开(公告)日: 2018-08-14
- 发明人: Yuichi Shibazaki
- 申请人: NIKON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2013-135714 20130628
- 国际申请: PCT/JP2014/066919 WO 20140626
- 国际公布: WO2014/208634 WO 20141231
- 主分类号: F16M11/00
- IPC分类号: F16M11/00 ; G03B27/58 ; G03B27/62 ; H02K11/02 ; G03F7/20 ; H01L21/68
摘要:
A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
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