- 专利标题: Liquid processing apparatus
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申请号: US15209982申请日: 2016-07-14
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公开(公告)号: US10046372B2公开(公告)日: 2018-08-14
- 发明人: Kazuya Goda , Yoshifumi Amano , Nobuya Yamamoto , Go Ayabe
- 申请人: Tokyo Electron Limited
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Abelman, Frayne & Schwab
- 优先权: JP2015-149512 20150729
- 主分类号: B08B13/00
- IPC分类号: B08B13/00 ; B08B3/04 ; H01L21/67
摘要:
A liquid processing apparatus includes a plurality of liquid processing units, a plurality of individual exhaust paths, a common exhaust path, a first outside air intake section, a first regulation valve, a second outside air intake section, and a second regulation valve. The liquid processing units perform a liquid processing on a processing target object. An exhaust gas from an inside of the liquid processing unit flows in the individual exhaust paths. The exhaust gas from the individual exhaust paths flows in the common exhaust path. The first outside air intake section is formed at the most upstream side to introduce outside air. The first regulation valve is provided in the first outside air intake section. The second outside air intake section is formed at a downstream side of the common exhaust path from the connection. The second regulation valve is provided in the second outside air intake section.
公开/授权文献
- US20170028450A1 LIQUID PROCESSING APPARATUS 公开/授权日:2017-02-02
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