Invention Grant
- Patent Title: Magnetic sensor device having a magneto-resistive structure that generates a vortex magnetization pattern
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Application No.: US15360079Application Date: 2016-11-23
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Publication No.: US10008225B2Publication Date: 2018-06-26
- Inventor: Wolfgang Raberg , Tobias Wurft
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Harrity & Harrity, LLP
- Priority: DE102015121753 20151214
- Main IPC: G11B5/39
- IPC: G11B5/39 ; G01R33/09 ; H01F10/32 ; G01R33/00

Abstract:
An embodiment relates to a magnetic sensor device, comprising a magneto-resistive structure. The magneto-resistive structure comprises a magnetic free layer configured to spontaneously generate a closed flux magnetization pattern in the magnetic free layer. The magneto-resistive structure also comprises a magnetic reference layer having a non-closed flux reference magnetization pattern. The magnetic sensor device further comprises a magnetic biasing structure configured to generate a biasing field in the magnetic free layer, the biasing field having a non-zero magnetic biasing field component perpendicular to the reference magnetization pattern.
Public/Granted literature
- US09978406B2 Magnetic sensor device having a magneto-resistive structure that generates a vortex magnetization pattern Public/Granted day:2018-05-22
Information query
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