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发明授权
CN1873541B 具有良好平坦度的基板卡盘的曝光装置 有权

具有良好平坦度的基板卡盘的曝光装置
摘要：
本发明公开了一种曝光装置，包括：掩模平台；用于支撑该掩模平台的支撑体；位于掩模平台下部的基板；用于支撑该基板的基板卡盘；用于移动该基板卡盘的基板卡盘移动装置；安装在基板卡盘移动装置上用于控制基板和掩模平台之间间隙的间隙动力单元；以及用于恒定保持基板卡盘平坦度的基板卡盘平坦度保持装置。因此，即使对大基板也能够以恒定的平坦度执行曝光工艺。
摘要（英）：

An exposing apparatus comprises a mask stage, a supporter that supports the mask stage, a substrate below the mask stage, and a substrate chuck that supports the substrate. The exposing apparatus further comprises a substrate chuck moving mechanism that moves the substrate chuck, a gap motor unit installed on the substrate chuck moving mechanism that controls a gap between the substrate and the mask stage, and a substrate chuck flatness maintaining mechanism that maintains a flatness of the substrate chuck.

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