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发明授权
CN1848365B 多晶硅薄膜制造方法和具有其的薄膜晶体管的制造方法 有权 转让

多晶硅薄膜制造方法和具有其的薄膜晶体管的制造方法
摘要：
本发明提供了一种多晶硅薄膜的制造方法和具有该薄膜的TFT的制造方法，其中，激光束被辐射到非晶硅薄膜的一部分，以使非晶硅薄膜的该部分液化。非晶硅薄膜位于基板的第一端部上。液化硅被晶化以形成硅晶粒。激光束在第一方向上被从基板的第一端部向与第一端部相对的第二端部移动一个间隔。激光束然后被辐射到与硅晶粒相邻的非晶硅薄膜的一部分以形成第一多晶硅薄膜。因此，非晶硅薄膜的电学特性可以被改进。
摘要（英）：

In a method of manufacturing a polysilicon thin film and a method of manufacturing a TFT having the thin film, a laser beam is irradiated on a portion of an amorphous silicon thin film to liquefy theportion of the amorphous silicon thin film. The amorphous silicon thin film is on a first end portion of a substrate. The liquefied silicon is crystallized to form silicon grains. The laser beam is shifted from the first end portion towards a second end portion of the substrate opposite the first end portion by an interval in a first direction. The laser beam is then irradiated onto a portion of the amorphous silicon thin film adjacent to the silicon grains to form a first polysilicon thin film. Therefore, electrical characteristics of the amorphous silicon thin film may be improved.

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