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发明授权
CN1834282B 成膜装置、成膜方法 失效 - 权利终止

成膜装置、成膜方法
摘要：
提供一种能够可靠地得到多个膜图案的成膜装置及成膜方法。本发明的成膜装置，其特征在于，具有：掩模部件，其由硅构成并具有所定图案的第1开口部(31)；磁性部件(4)，其由磁性材料构成并具备第(2)开口部(41)，以在该第(2)开口部(31)的俯视内侧配设上述第1开口部的方式与上述掩模部件(3)对位而成；基板夹持用部件(1)，其在与上述磁性部件(4)之间从该磁性部件(4)侧依次夹持上述掩模部件(3)和被成膜基板(2)，同时通过在该磁性部件(4)之间所产生的磁力将上述掩模部件(3)和上述被成膜基板(2)密接。
摘要（英）：

A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged in the second opening in plan view of the second opening; and a substrate holding member that generates magnetic force between the magnetic member and itself in order to adhere the mask member and a substrate to each other. The mask member and the substrate are interposed between the magnetic member and the substrate holding member in this order from the magnetic member.

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