A novel pulsating plasma power supply for pumping out ions from a target material comprises a preceding-stage direct-current power supply module, a pulse modulator module and a synchronous controllermodule. The preceding-stage direct-current power supply module at least comprises a first direct-current power supply module and a second direct-current power supply module; the pulse modulator moduleat least comprises a first pulse modulator module and a second pulse modulator module; the first direct-current power supply module and the first pulse modulator module provide the energy required bythe high-energy impact magnetron sputtering discharge; the second direct-current power supply module and the second pulse modulator module provide the energy required for pumping out ions to form pulsating plasmas; the energy stored in the two direct-current power supply modules is modulated by the first pulse modulator module and the second pulse modulator module and then is discharged into a plasma generation device in a pulse manner, and the synchronous controller module synchronously controls the pulse modulator module. According to the invention, the ions sputtered from the target material in the high-energy impact magnetron sputtering can be accelerated.