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发明公开
CN108848606A 用于回旋加速器内部离子源的位置调节方法 有权

用于回旋加速器内部离子源的位置调节方法
摘要：
本发明公开了一种回旋加速器及其内部离子源位置的调节方法，其中该调节方法包括以下步骤：在所述内部离子源的尾部法兰处设置用于调节所述内部离子源位置的位置调节结构，其中所述达标位置在所述位置调节结构的调节位置范围之内；在将所述内部离子源与中心区主磁铁进行装配时，根据引出束流各个参数的要求标准，使用所述位置调节结构对所述内部离子源的位置进行调节；当所述引出束流的各个参数均达标时，停止对所述内部离子源的位置调节，并计算出此时所述内部离子源所处的位置，将该位置作为所述内部离子源的所述达标位置。本发明能将内部离子源的位置调节到达标位置，保证回旋加速器整机的稳定运行。
摘要（英）：

The invention discloses a cyclotron and a method for adjusting position of an internal ion source thereof, wherein the adjusting method comprises the following steps: providing a position adjusting structure for adjusting the position of the internal ion source at a tail flange of the internal ion source, wherein a standard reaching position is within a position adjusting range of the position adjusting structure; when the internal ion source is assembled with a central area main magnet, using the position adjusting structure to adjust the position of the internal ion source according to a required standard for each parameter of an extraction beam; when each parameter of the extraction beam reaches the standard, stopping position adjustment of the internal ion source, calculating the position of the internal ion source at this time, and taking the position as the standard reaching position of the internal ion source. The cyclotron and the method for adjusting position of the internal ion source thereof in the invention can adjust the position of the internal ion source to reach the standard reaching position and ensure stable operation of the whole cyclotron.

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