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发明公开
CN108374147A 掩模组件的制造方法 有权

掩模组件的制造方法
摘要：
本发明涉及能够提升图案精度的掩模组件的制造方法，该方法包括以下步骤：准备载体衬底；在载体衬底上涂覆第一光致抗蚀剂；对第一光致抗蚀剂进行图案化以形成第一光致抗蚀剂图案；在载体衬底和第一光致抗蚀剂上涂覆第二光致抗蚀剂；对第二光致抗蚀剂进行图案化以形成第二光致抗蚀剂图案；在载体衬底上沉积金属层；去除布置在第一光致抗蚀剂图案和第二光致抗蚀剂图案上的金属层；以及将载体衬底与金属层分离以制造分割掩模，其中，第一光致抗蚀剂为正(positive)性光致抗蚀剂，而第二光致抗蚀剂为负(negative)性光致抗蚀剂。
摘要（英）：

The invention relates to a manufacturing method of a mask assembly. The method includes the steps of: preparing a carrier substrate; coating the carrier substrate with a first photoresist; patternizing the first photoresist to form a first photoresist pattern; coating the carrier substrate and the first photoresist with a second photoresist; patternizing the second photoresist to form a second photoresist pattern; depositing a metal layer onto the carrier substrate; removing the metal layer on the first photoresist pattern and second photoresist pattern; and separating the carrier substrate and the metal layer to form separated mask; herein, the first photoresist is a positive photoresist while the second photoresist is a negative photoresist.

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