The invention discloses a composition for etching an indium oxide layer and a molybdenum layer. An etching composition herein serves as an indium oxide layer, a molybdenum layer or a multi-layer etching composition of an indium oxide layer and a molybdenum layer. The etching composition includes a nitric acid, a cyclic amine compound, a fluorinated compound and an organic acid which represents 0.1-5.0 weight % of the total weight of the composition. According to the invention, the etching composition exhibits excellent etching properties for the etching indium oxide layer and the molybdenum layer of a pixel electrode which serves as an array substrate for a liquid crystal display apparatus, can minimize damage to a lower metal, and can suppress the generation of upper tip upon etching the multi-layer film. Therefore, the etching composition can increase the driving characteristics of the liquid crystal display apparatus.