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CN107094371A 用于在具有束减速的离子注入器中进行束角度调整的系统和方法 无效 - 撤回

用于在具有束减速的离子注入器中进行束角度调整的系统和方法
摘要：
离子注入系统(110)使用质量分析器(126)来进行质量分析和角度校正。离子源沿束路径产生离子束(124)。质量分析器放置在离子源的下游，所述质量分析器对离子束执行质量分析和角度校正。位于孔径组件(133)内的分辨孔径(134)位于质量分析器部件的下游并位于束路径上。分辨孔径具有根据所选择的质量分辨率以及离子束的束包络的尺寸和形状。角度测量系统(156)位于分辨孔径的下游并获得离子束的入射角值。控制系统(154)根据来自角度测量系统的离子束的入射角值导出针对质量分析器的磁场调整。
摘要（英）：

An ion implantation system (110) employs a mass analyzer (126) for both mass analysis and angle correction. An ion source generates an ion beam (124) along a beam path. A mass analyzer is located downstream of the ion source that performs mass analysis and angle correction on the ion beam. A resolving aperture (134) within an aperture assembly (133) is located downstream of the mass analyzer component and along the beam path. The resolving aperture has a size and shape according to a selected mass resolution and a beam envelope of the ion beam. An angle measurement system (156) is located downstream of the resolving aperture and obtains an angle of incidence value of the ion beam. A control system (154) derives a magnetic field adjustment for the mass analyzer according to the angle of incidence value of the ion beam from the angle measurement system.

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