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发明授权
CN106449462B 电迁移测试结构 有权

电迁移测试结构
摘要：
本发明提供了一种电迁移测试结构，包括：金属测试线、金属通孔、测试结构金属引线、连接用金属垫、最上层金属连线以及测试金属垫；其中，金属测试线的两端分别通过一个金属通孔连接至一个测试结构金属引线，而且各个测试结构金属引线分别连接至一个连接用金属垫；每个连接用金属垫连接至一个测试金属垫的最上层金属；其中每个连接用金属垫包括经由通孔依次连接的多层金属层，而且每个测试金属垫包括经由通孔依次连接的多层金属层。
摘要（英）：

The invention provides an electromigration test structure. The electromigration test structure comprises a metal test line, metal through holes, test structure metal leads, metal pads for connection, uppermost metal connection lines and test metal pads. Each of two ends of the metal test line is connected to one of the test structure metal leads through one of the metal through holes, and each of the test structure metal leads is connected to one of the metal pads for connection. Each of the metal pads for connection is connected to an uppermost metal layer of one of the test metal pads and comprises a plurality of metal layers in sequential connection by the aid of through holes, and each of the test metal pads comprises a plurality of metal layers in sequential connection by the aid of through holes.

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