知搜-全球专利检索

  1. 登录
  2. 注册
发明授权
CN106024564B 衬底处理装置及半导体器件的制造方法 有权 转让

衬底处理装置及半导体器件的制造方法
摘要：
本发明涉及衬底处理装置及半导体器件的制造方法。提供在衬底面内形成均匀的膜的技术。具有：衬底载置部，对衬底进行载置；腔盖，与衬底载置部的至少一部分相对，并且在中央具有气体供给通路；气体供给结构，与气体供给通路连通；反应气体供给部，与气体供给结构连接，具有等离子体生成部；管，设置于气体供给结构内及所述气体供给通路内，与反应气体供给部连通；气体供给部，与气体供给结构连接，向管的外周侧、气体供给结构内侧供给气体。
摘要（英）：

A technology for forming a uniform film in a plane of a substrate involves a substrate processing apparatus including: a substrate support where a substrate is placed; a cover facing at least a portion of the substrate support, the cover including a gas supply channel at a center thereof; a gas supply structure connected to the gas supply channel; a reactive gas supply unit connected to the gas supply structure and including a plasma generating unit; a tube connected to the reactive gas supply unit and extending from the gas supply structure to the gas supply channel; and a gas supply unit connected to the gas supply structure and configured to supply a gas to a space between an outer surface of the tube and an inner surface of the gas supply structure.

公开/授权文献
0/0