知搜-全球专利检索

  1. 登录
  2. 注册
发明授权
CN105899709B CVD反应器的具有重量减小的排气板的进气机构 有权

CVD反应器的具有重量减小的排气板的进气机构
摘要：
本发明涉及一种设备，用于实施CVD处理过程，所述设备具有进气机构(2)，所述进气机构(2)布置在反应器壳体(1)中并且具有朝向处理室(3)的排气板(8)，所述排气板(8)具有多孔材料和多个排气孔(9、9′)，通过布置在所述进气机构(2)中的气体分配室(7、21、26)为所述排气孔(9、9′)供给处理气体。为了从制造技术上改进具有较大涂层面的进气机构、尤其用于CVD反应器的进气机构，在此建议，多孔材料构成所述排气板(8)的芯件(12)，所述芯件(12)的与处理气体接触的表面区段被封装。
摘要（英）：

A device for carrying out a CVD process comprises a gas inlet element, which is arranged in a reactor housing and has a gas outlet plate, which faces a process chamber, comprises a porous material and has a multiplicity of gas outlet openings, which are fed with process gases from a gas distributing volume arranged in the gas inlet element. In order to improve production aspects of a gas inlet element, in particular for a CVD reactor with a large coating area, it is proposed that the porous material forms the core of the gas outlet plate, the surface segments of which that come into contact with the process gas are sealed.

公开/授权文献
0/0