The invention relates to a polarization system (1) comprising the following features: - a first substrate (3) composed of a first substrate material with a first layer system (3a) applied thereto, and, disposed downstream in a beam path (2) formed by a beam source, at least one second substrate (4) composed of a second substrate material with a second layer system (4a) applied thereto; - wherein the first and second layer systems comprise a first stack (3b, 4b) applied on the substrate and a second stack (3c, 4c) applied on the first stack; - wherein the first stack comprises an alternating sequence of high and low refractive index oxidic layers; - wherein the second stack comprises an alternating sequence of high and low refractive index fluoridic layers; - wherein the first layer system (3a) splits an unpolarized beam (2a), which forms the beam path (2) and impinges on the layer system (3a) at an angle phi that is greater than the Brewster angle for the substrate material used, into a first component (2d), which is for the most part polarized and is transmitted through the substrate, and at least one second component (2e), which is for the most part polarized and is reflected at the layer system (3a); - wherein the first layer system (3a) is designed in terms of its number of oxidic and fluoridic layers in such a way that the proportion of the reflected and polarized second component (2e) is at least 90%; - wherein the second layer system (4a) splits a beam, which forms the beam path, has a proportion of the for the most part polarized second component (2e) of at least 90% and impinges on the layer system, into a first component (2d), which is for the most part polarized and is transmitted through the substrate, and at least one second component (2e), which is for the most part polarized and is reflected at the layer system (4a), wherein the proportion of the for the most part polarized second component is greater downstream of the second layer system than downstream of the first layer system.