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发明公开
CN105220130A 基于低压等离子化学气相沉积制备纳米多层膜的方法 有权

  • 专利标题： 基于低压等离子化学气相沉积制备纳米多层膜的方法
  • 专利标题（英）： Method for preparing nano-multilayer film based on low-pressure plasma chemical vapor deposition
  • 申请号： CN201510638661.1
    申请日： 2015-09-29
  • 公开(公告)号： CN105220130A
    公开(公告)日： 2016-01-06
  • 发明人: 梁磊
  • 申请人： 佛山市思博睿科技有限公司
  • 申请人地址： 广东省佛山市南海区狮山镇罗村朗沙广东新光源产业基地核心园区内C区7座第五层(1-6轴)厂房
  • 专利权人： 佛山市思博睿科技有限公司
  • 当前专利权人： 佛山市思博睿科技有限公司
  • 当前专利权人地址： 广东省佛山市南海区狮山镇罗村朗沙广东新光源产业基地核心园区内C区7座第五层(1-6轴)厂房
  • 主分类号： C23C16/455
  • IPC分类号： C23C16/455 ;  C23C16/40
基于低压等离子化学气相沉积制备纳米多层膜的方法
摘要：
本发明公开一种可准确控制每层厚度、以及均匀度，增加膜层与基体粘合力的低压等离子化学气相沉积的方法，本方法步骤如下：a.往反应腔内放置基体工件，对反应腔进行抽真空；b.抽真空后向反应腔内注入氧气，开启微波源，微波经ECR微波电子回旋共振后，向反应腔内提供微波电离氧分子，对基体进行表面活性化处理及洁净化处理；交替电离TiCl4气体和氧气的混合气体，以及六甲基二硅氧烷气体和氧气的混合气体，在工件表面交替沉积多层TiO2和SiO2薄膜。
摘要（英）：

The invention discloses a low-pressure plasma chemical vapor deposition method which be used for accurately controlling the thickness and evenness of each layer and improve the bonding force between a film layer and a base body. The method includes the following steps that firstly, a base body workpiece is put into a reaction cavity, and vacuum pumping is conducted on the reaction cavity; secondly, oxygen is injected into the reaction cavity after vacuum pumping is conducted, a microwave source is supplied, after ECR microwave electron cyclotron resonance is conducted on microwaves, microwave ionization oxygen molecules are supplied to the interior of the reaction cavity, and surface activating processing and cleaning processing are conducted on the surface of the base body; and thirdly, the mixed gas of TiCl4 gas and oxygen and the mixed gas of hexamethyldisiloxane gas and oxygen are alternately ionized, and multiple layers of TiO2 films and SiO2 films are deposited on the surface of the workpiece alternately.

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