The invention provides a manufacturing method for an FFS array substrate. The manufacturing method includes the following steps that a grid electrode and a common electrode are formed on a glass substrate, and the grid electrode is formed on the upper face of part of the common electrode; a grid electrode insulation layer is formed on the grid electrode and the common electrode; a transparent metal-oxide semiconductor layer is deposited on the grid electrode insulation layer, one time of patterning processing is conducted on the transparent metal-oxide semiconductor layer, and a semiconductor active layer precursor and a pixel electrode precursor are formed; ion implantation processing is conducted on the two ends, without the reservation of light resistance layers, of the semiconductor active layer precursor and the pixel electrode precursor, and transparent conductors can be formed by the semiconductor active layer precursor and the pixel electrode precursor; finally, a source electrode and a drain electrode are formed on a semiconductor active layer. According to the manufacturing method, the photomask times needed in manufacturing of the FFS array substrate can be reduced, and the manufacturing efficiency of the FFS array substrate is improved.