The utility model provides a circulating type uniform etching device. The circulating type uniform etching device comprises a tank, a bearing plate, a plurality of acid outlet pipes, an acid return pipe and a plurality of bubble pipes, wherein an etching liquid is contained in the tank, the bearing plate is arranged in the tank and is adjacent to the bottom of the tank, the bearing plate and the bottom of the tank jointly define a backflow channel, the acid outlet pipes are arranged on the bearing plate, the acid return pipe is arranged at the bottom of the tank, is communicated with the backflow channel and is connected to the acid outlet pipes by virtue of a backflow pipeline, and the bubble pipes are arranged on the bearing plate and are used for providing bubbles so as to promote the disturbance of the etching liquid. The circulating type uniform etching device provided by the utility model can be matched with fluctuation generated by a carrier to ensure that the surface of a machined part is uniform and thinned.