Positional shifts between phase distribution on a wave-front sensor and a phase pattern for compensating on a waved-front modulation element are compensated for quickly and with high precision by a method that includes: a first step that displays a singular point generating pattern on a wave-front modulation element (12); a second step for measuring a wave-front shape for adjustment on a wave-front sensor (11) when a light image modulated by the singular point generating pattern is incident to the sensor (11); a third step for detecting the position of the singular point in the wave-front shape for adjustment from the measurement results by the sensor (11); and a fourth step for adjusting the positions of the wave-front shape measured by the wave-front sensor (11) and the pattern for compensation displayed on the wave-front modulation element (12).