The invention discloses a method for improving the use rate of targets for magnetic control spluttering film coating. The method comprises the following steps that (1) a line cutting machine is used for cutting residue targets in an erosion curve surface of the residue targets to obtain a plurality of spliced targets according to a spluttering track of the residue targets; a cutting line selection method comprises the processes that the width vertical line is selected, an included angle between the cutting line and the width vertical line is between 0 to 30 DEG C, and the width vertical line is positioned at the deepest use part of the residue targets and is vertical to the width direction of the residue targets; (2) each spliced target is cleaned; (3) the cleaned spliced targets are connected in a splicing way, the spliced targets are welded with a back plate, machine loading is carried out again after the welding, and the sputtering film coating is carried out. The method has the advantages that the use rate of the targets for magnetic control spluttering film coating is improved to 40 percent, meanwhile, the production cost is lowered, and the resource waste is reduced. The method is particularly applicable to noble metal and oxide targets.