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发明公开
CN103288453A 用于离子注入装置束流线内部部件的石墨部件 无效 - 驳回

用于离子注入装置束流线内部部件的石墨部件
摘要：
本发明涉及用于离子注入装置束流线内部部件的石墨部件。一种在高电流低能量型离子注入装置中用于离子注入装置束流线(beam line)内部部件的石墨部件，该石墨部件能够显著减少结合到晶片表面中的颗粒的数量。还提供了用于离子注入装置束流线内部部件的石墨部件，该部件具有1.80Mg/m3或更高的堆积密度和9.5μΩ·m或更低的电阻。优选地，在石墨部件的自然断黏（natural fracture)表面的拉曼光谱中用1370cm-1处的D谱带强度除以1570cm-1处的G谱带强度得到的R值为0.20或更低。
摘要（英）：

The invention relates to a graphite member for a beam-line internal member of an ion implantation apparatus. The problem of the present invention is to provide, in high current - low energy type ion implantation apparatuses, a graphite member for a beam line inner member of an ion implantation apparatus, wherein the graphite member can markedly reduce particles incorporated in a wafer surface. This problem can be solved by the graphite member of the present invention, which is the graphite member for the beam-line inner member of the ion implantation apparatus, with the member having a bulk density of not less than 1.80 Mg/m<3> and an electric resistivity of not more than 9.5 [mu] CRxm. Preferably, the R value obtained by dividing D band intensity at 1370 cm<-1> by G band intensity at 1570 cm<-1> in the Raman spectrum of a spontaneous fracture surface of the graphite member is not more than 0.20.

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