The embodiment of the invention discloses a preparation method for a double-faced power generation metal wrap through (MWT) solar cell. The method comprises the following steps of: forming a positive-negative (PN) junction on the upper surface of a silicon wafer, and forming a back field on the lower surface of the silicon wafer; drilling a hole at the preset position of the silicon wafer by adopting lasers; printing a corrosive material within a preset range around the hole drilled by the lasers by adopting a screen printing process; drying the corrosive material; and cleaning the silicon wafer. When the double-faced power generation solar cell is prepared by adopting the method provided by the invention, an affected layer caused by laser hole drilling is also removed while the back field is removed, and moreover, the process flow is simplified, and the cost is favorably controlled.