Disclosed is a pellicle which has a mask adhesive layer that has adequate softness and good handling properties, said mask adhesive layer leaving only few adhesive residue when separated from a mask. Particularly disclosed is a pellicle which is capable of suppressing displacement of a pattern during double patterning. The pellicle comprises a pellicle frame, a pellicle film that is arranged on one end face of the pellicle frame, and a mask adhesive layer that is arranged on the other end face of the pellicle frame. The mask adhesive layer contains 35-170 parts by mass (inclusive) of a hardness adjusting agent (B), which contains a polypropylene (b1) and a propylene elastomer (b2), per 100 parts by mass of a styrene resin (A). A phase separation structure composed of a continuous phase of the styrene resin (A) and dispersed phases of the hardness adjusting agent (B) is observed in an electron microscopic image of the mask adhesive layer.