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发明公开
CN102117013A 光刻胶组合物 无效 - 撤回

光刻胶组合物
摘要：
本发明提供了一种光刻胶组合物，其包含：包含式(I)表示的结构单元的树脂和式(D’)表示的化合物：其中Q1和Q2独立地表示氟原子等，U表示C1-C20二价烃基等，X1表示-O-CO-等，A+表示有机反荷离子，其中R51、R52、R53和R54独立地表示C1-C20烷基等，A11表示可具有一个或更多个取代基并可含有一个或更多个杂原子的C1-C36饱和环状烃基。
摘要（英）：

The present invention provides a photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents -O-CO- etc., and A+ represents an organic counter ion, and a compound represented by the formula (D'): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

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