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发明授权
CN101911256B 激光退火方法以及装置 有权

激光退火方法以及装置
摘要：
本发明涉及激光退火方法以及装置。在透镜阵列方式的均化器光学系统的情况下，一边使长轴用透镜阵列(20a、20b)在与线状光束的长轴方向对应的方向(X方向)往复移动，一边进行激光照射，由此，入射到在后级设置的构成长轴用聚光光学系统的大型透镜(长轴用聚光透镜22)的激光(1)的入射角以及强度按照每次发射而变化，所以，纵向条纹被大幅度降低。另外，一边使短轴用透镜阵列(26a、26b)在与线状光束的长轴方向对应的方向(Y方向)往复移动，一边进行激光照射，由此，入射到在后级设置的构成长轴用聚光光学系统的大型透镜(投影透镜30)的激光(1)的入射角以及强度按照每次发射而变化，所以，横向条纹被大幅度降低。
摘要（英）：

In the case of a lens array type homogenizer optical system, laser beam irradiation is carried out while lens arrays (20a, 20b) for a long axis are made to move back and forth in a direction (X direction) corresponding to the long axis direction of a linear beam, so that an incident angle and the intensity of laser light (1) incident on a large scale lens (condenser lens (22) for a long axis) composing a light collecting system set at a latter stage for a long axis are changed for every shot and a vertical stripe is greatly reduced. Further, laser beam irradiation is carried out while lens arrays (26a, 26b) for a short axis are made to move back and forth in a direction (Y direction) corresponding to the short axis direction of a linear beam, so that an incident angle and the intensity oflaser light (1) which is incident on a large scale lens (projection lens (30)) composing a light collecting system set at a latter stage for a short axis are changed for every shot and a horizontal stripe is greatly reduced.

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