The invention discloses a method for depositing a nano laminated composite thin film by adopting a non-self-limiting growth mechanism. The method comprises the steps of: 1, introducing a first type of precursor to a reaction chamber and depositing a first layer of thin film in a non-self-limiting mode; 2, evacuating the first type of precursor; 3, introducing a second type of precursor to the reaction chamber and depositing a second layer of thin film in a non-self-limiting mode; 4, evacuating the second type of precursor; 5, introducing a third type of precursor to the reaction chamber and depositing a third layer of thin film in a non-self-limiting mode; 6, evacuating the third type of precursor; and 7, continuing the previous steps to sequentially deposit the thin films from the fourth layer to the Nth layer till the completion of thin film growth, wherein N is natural number. By adopting the non--self-limiting growth theory controlled by pulse to grow the nano laminated composite thin film, the invention has the advantages of rapid growth speed, strong step covering capability and strong control capability on multi-layer thin film components and can be used for the rapid growth of the multi-layer nano laminated composite thin film.