Provided is a photosensitive resin composition, which has short drying time, no coating unevenness and uniform coating film thickness when the pressure reduction drying or vacuum drying method are not adopted to perform natural drying after narrow slit coating, and has good against corrosion pattern shape after exposure and developing. The photosensitive resin composition adopting a photosensitive resin composition containing alkali soluble phenolic resin, photosensitizer containing quinone diazido, and a mixed solvent of propylene glycol monomethyl ether acetate (A) and a solvent (B) whose boiling point is below 145 DEG C and n-butyl acetate evaporation velocity is more than 50, is coated on the substrate through a narrow slit coating method, dried without adopting a pressure reduction drying or vacuum drying method, and then exposure and developing are performed to form anticorrosion patterns.