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发明授权
CN101479054B 一种光阻涂布和显影装置中的管路自动清洗装置 失效 - 权利终止

一种光阻涂布和显影装置中的管路自动清洗装置
摘要：
本发明提供一种光阻涂布和显影装置中的管路自动清洗装置，该光阻涂布和显影装置包括鼓泡罐(15)，鼓泡罐输出管路，压力表(13)，流量计(11)(12)，HMDS—空气供应、排放的气动开关阀(14)和HMDS—空气分配管路的气动开关阀(21)，管路自动清洗装置包括两位三通气动换向阀(52)，同上述HMDS—空气供应、排放的气动开关阀(14)连接，设置在压力表(13)与流量计(11)、流量计(12)之间的氮管路，设置在鼓泡罐(15)的出口处的氮管路。利用本发明所述装置可以免去对管路压入清洁剂的麻烦，又可以在不改变软件设定的状态下，实现管路的自动清洗，还可以防止己二胺(HMDA)泄漏，或者盖子没有安装正确造成的真空异常或者晶片刮伤。
摘要（英）：

The present invention provides an automatic purging device for purging the pipeline of a photoresist coating and developing apparatus. The photoresist coating and developing apparatus includes a bubble tank(15), an output pipeline, a pressure meter(13), a flowmeter(11,12), an air actuated valve(14) for feeding/discharging HMDS-air and an air actuated valve (21) for distributing HMDS-air. The automatic purging device for purging the pipeline includes a bi-position threeway air actuated change valve(52) connected to said air actuated valve (14) for feeding/discharging HMDS-air, nitrogen gas pipelines provided between the pressure meter(13) andthe flowmeter(11) and between the pressure meter(13) and the flowmeter(12), and a nitrogen gas pipeline provided at the outlet of the bubble tank(15).According to the present invention, the device has the following advantages: not have to feed cleaning agent to the purged pipelines, to achieve automatically purging the pipelines on holding the condition set by the software, to prevent HMDA leaking, or to prevent abnormal vacuum or a wafer scuffing caused due to falsely fixing a cover.

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